TES | Ion mill

Polygon Physics’ TES Ion mill delivers focused ion beams for ion milling and ion beam figuring purposes with energies up to 10 keV. It can be mounted directly onto a CF40 or KF40 flange, but also remotely through flexible cables to allow for source movement under...

TES | High brightness ion source

Polygon Physics’ TES High Brightness ion source is mainly developed as injection source for optical systems of FIBs, accelerators, and surface analysis equipment. Directly mounted on a grounded Ø63mm CF or KF flange, this source generates parallel ion beams of up to...

TES | Single-cavity ECR-plasma based sources

TES is a family of ion sources, electron sources, plasma sources, and atom sources, based on patented mono-cavity ECR technology.Starting from the same core element a wide variety of sources can be built, ranging from a focused beam source for ion milling and ion beam...

HEXAR | Broad Beam ECR source

Polygon Physics’ HEXAR is a broad beam ion source designed for surface processing in vacuum. HEXAR is a scalable concept that enables the fabrication of sources adapted to the treatment of a wide range of surface sizes. Typical applications are ion beam etching,...

IE-GUN | ECR source for high energy beams

Plug & Play up to 50kV IE-gun is our single cavity ECR source module for plug & play high energy ion or electron beams. It can be configured up to 50kV, and mounted on any vacuum system with a 160mm (<30kV: 100mm) CF or LF flange and adequate pumping speed....

Custom beam solutions

We see our ECR plasma cavities as little building blocks that can serve as individual plasma sources, ion sources, electron sources, or atom sources, but that can also be grouped together to create plasma sheets or ion beams of basically any size and shape. Whether...