HEXAR | Broad Beam ECR source

Polygon Physics’ HEXAR is a broad beam ion source designed for surface processing in vacuum. HEXAR is a scalable concept that enables the fabrication of sources adapted to the treatment of a wide range of surface sizes. Typical applications are ion beam etching,...

TES | Multipurpose ECR source

Polygon Physics’ TES is a compact ECR source, designed for surface science & processing based on ions, plasma, electrons, or atoms, in UHV or HV environment. It can be configured up to 10kV on a 40mm CF or KF flange. For other types of ECR sources, check our IE...

IE-GUN | ECR source for high energy beams

Plug & Play up to 30kV IE-gun is our single cavity ECR source module for plug & play high energy ion or electron beams. It can be configured up to 30kV, and mounted on any vacuum system with a 100mm CF or LF flange and adequate pumping speed. Just plug it in,...

Custom beam solutions

We see our ECR plasma cavities as little building blocks that can serve as individual plasma sources, ion sources, electron sources, or atom sources, but that can also be grouped together to create plasma sheets or ion beams of basically any size and shape. Whether...

Multi Beam Sputter Deposition Systems

Our answer to the demand for higher throughput in multicomponent materials research: multi beam sputter deposition. A unique geometry for thin film deposition based on ion beam sputtering, with multiple ion beams generated by our ultracompact and ultralow power ECR...

Multifunctional surface treatment systems

One ion source, multiple surface treatments. Polygon Physics offers a package deal for R&D purposes: a single system with which you can do a series of surface processing steps on the same sample without having to breaking the vacuum. Multiple surface processing...