Ion beam sputter deposition

Adding a thin film In ion beam sputter deposition the goal is to add a thin film to the substrate surface to change its material properties. The concept of ion beam deposition is an ion beam that sputters a target in proximity to the substrate. Ion beam deposition is...

Ion implantation

Compositional and structural change The goal of ion implantation is to add ions to the interior of a substrate to change its material properties. The incoming ions change the elemental composition, but they also induce a structural change because they transfer energy...

Ion beam figuring

An eraser tool for surface errors In ion beam figuring the goal is to create, by locally sputtering atoms, a surface with a specified profile. It is a technique that can be used for precise figuring and finishing of optical elements, such as spheres, aspheres and free...

Ion assisted deposition

Improving thin film properties during deposition In ion assisted deposition the goal is to modify the properties of a growing thin film by directing an ion beam at it. Ion assistance is often used in combination with thin film deposition by evaporation or other...

Nuclear and atomic physics

Originally developed as a simple, miniature, and low power particle source for accelerators, our ECR ion sources have found their way into various atomic and nuclear physics applications. Gas ionization chamber for mass spectrometry To analyze a gas with mass...