Applications

In ion beam sputter deposition the goal is to add a thin film to the substrate surface to change its material properties. The concept of ion beam deposition is an ion beam that sputters a target in proximity to the substrate…

The goal of ion implantation is to add ions to the interior of a substrate to change its material properties. The incoming ions change the elemental composition, but they also induce a structural change because they transfer energy and momentum to the substrate…


In ion beam figuring the goal is to create, by locally sputtering atoms, a surface with a specified profile. It is a technique that can be used for precise figuring and finishing of optical elements, such as spheres…

Sputter cleaning, ion polishing, ion milling or& cutting, all are based on ion beam sputtering. Ion beam sputtering with noble gas ions is a physical technique to remove surface layers…


In ion assisted deposition the goal is to modify the properties of a growing thin film by directing an ion beam at it. Ion assistance is often used in combination with thin film deposition by evaporation or other techniques…

Originally developed as a simple, miniature, and low power particle source for accelerators, our ECR ion sources have found their way into various atomic and nuclear physics applications…