Polygon Physics has developed a variety of sources around the same core element: a patented mini ECR plasma cavity (TES).
From physical sputtering up to implantation with energetic ions, to slow radicals for chemical surface action only, the source design determines which plasma particles leave the source and how.
Surface cleaning, neutralization, UHV oxidation/nitriding, ion beam figuring, select the source optimized for your application.
Linear beams, circular beams, arrays of beams, small or large. Our unique ECR technology allows us to design ion beams of any size and shape. Whether you need a 1 millimeter beam or a 1×1 meter beam, we look forward to creating your beam of choice.
Always based on our own ECR technology, Polygon Physics designs and fabricates complete vacuum systems for surface treatments, ranging from small R&D setups to fully automated large scale industrial systems. Possible surface processes are e.g. (multi) ion beam sputter deposition, sputter cleaning, nanostructuring, ion implantation, …
A good day at Polygon Physics today: our new plug&play 50kV ion source has produced its first 50kV beam! This ECR based ion source can be plugged onto any Ø160mm flange opening. No need for a high voltage platform; the source is mounted on a ground flange....read more
Learn more about our brand new ion beam deposition system with unique possibilities for combinatorial materials research! We are ready for you at the SVTM2018 in Bordeaux, France at booth 24, or come listen to our talk on Wednesday June 13 at 15h at the associated...read more
How convenient to be able to switch from a positive ion source to a negative ion source, without changing any hardware! Recent results with our multipurpose ECR source TES in high brightness ion mode demonstrated its bipolar capability. Upon changing the polarity of...read more
Industrial project management
With experience in both industry and academia the Polygon Physics team knows what is involved in bringing a project to full fruition.